01
CVD
Chemical vapor deposition is a traditional technique for preparing thin films. Its principle is to use gaseous precursor reactants to decompose certain components in the gaseous precursor through chemical reactions between atoms and molecules, forming thin films on the substrate.
02
PVD
PVD (Physical Vapor Deposition) coating technology is mainly divided into three categories: vacuum evaporation coating, vacuum sputtering coating, and vacuum ion coating. The main methods of physical vapor deposition include vacuum evaporation, sputtering coating, arc plasma coating, ion coating, and molecular beam epitaxy.
The company mainly researches, designs, and produces magnetron sputtering coating equipment, resistance evaporation coating equipment, electronic evaporation coating equipment, ion evaporation coating equipment, multifunctional composite coating equipment, powder coating equipment, CVD diamond coating equipment, high vacuum heat treatment furnaces such as high vacuum annealing furnaces, high vacuum sublimation purification furnaces, consumable vacuum arc furnaces, as well as application-oriented customized vacuum equipment and supporting process technologies. Types of vacuum coater for sale is widely used in the research and development of thin film new materials in major universities and research institutes, as well as in the research and mass production of thin film new materials by enterprises.
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